Effects of Surface Steps

 on Sputtering

and

Surface Defect Formation

 

Andreas Friedrich and Herbert M. Urbassek

andreas-friedrich@web.de and urbassek@rhrk.uni-kl.de        

Trennlinie

 

 

 

Abstract

Using molecular-dynamics simulation, we study sputtering and defect formation induced by oblique 5 keV Xe  ion impact on a Pt (111) surface. Impact on a terrace produces yield maxima at J = 60 -65° incidence angle towards the surface normal. Beyond 75° -80°, no damage is produced due to projectile ion reflection.
Impact on a dense-packed step, however, produces defects in sizeable numbers up to glancing incidence, J = 85°. The dependence of the yields on the incidence angle and distance of the impact point of the projectile to the step have been investigated .

Animations

These movies show 5 keV Xe ion impact on a Pt (111) surface:

     impact on a flat terrace (polar angle  80°)

     impact on a b-step  (polar angle 80°, cell  ξ = -1)

     impact on a b-step  (polar angle 80°, cell  ξ = -9)

     impact on a b-step  (polar angle 80°, cell  ξ = -11)

 

Further information:

Effects of Surface Steps on Sputtering and Surface Defect Formation (to be published).

Zerstäubung und Defektentstehung unter schrägem Edelgasionenbeschuss (german  page).